Provides a controlled and repeatable fabrication process for patterning 2D nanomaterials, integrating deposition, photolithography and etching steps to produce device-ready structures with greater process control.

Fabricating patterned two-dimensional nanomaterial devices requires precise and controlled removal of nanomaterial and catalyst layers without damaging the underlying device structure, making process consistency and pattern integrity challenging.

Provides a controlled fabrication process for patterning two-dimensional nanomaterials on a substrate through deposition, catalyst formation, photolithography, reactive-ion etching, wet etching and stripping while maintaining the required device structure.

Provides an integrated fabrication sequence combining CVD growth with photolithography, reactive-ion etching and wet etching to produce controlled patterns of two-dimensional nanomaterials directly on a substrate.